When exposed to light sources with certain wavelength: for positive photoresist materials, the exposed parts will be washed off by developer and the rest of the unexposed parts will remain on the substrate; while for negative photoresist materials, the exposed parts will remain on the substrate after developing, while the unexposed parts will be washed off.
So my question is, when I mix any positive and negative photoresist together, what will happen after exposure to light sources and developing? Which parts will be washed off?